Advanced Nanomaterials, Two Volume Edition by Kurt E. Geckeler, Hiroyuki Nishide PDF

By Kurt E. Geckeler, Hiroyuki Nishide

ISBN-10: 3527317945

ISBN-13: 9783527317943

ISBN-10: 3527628959

ISBN-13: 9783527628957

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The soluble block “corona” stretches out into the solvent and masks the solvophobic “core”. Cylindrical (and other) morphologies can be formed by tuning the relative volume fraction of the blocks. has prompted many investigators to explore their use as templates [27], encapsulating agents [28], or drug delivery systems [29]. 6 Synthesis of Block Copolymers Using Living Polymerization Techniques BCPs are produced by the sequential addition of monomers into a “living” polymerization system [30]. , chain termination or chain transfer) during growth of the polymer chain.

The PFS block contained elemental iron and silicon, which made it highly resistant to dry-etching processes due to the creation of iron and silicon oxides during oxygen etching. The resulting etching ratio between PS and PFS was estimated to be as high as 50:1. Thus, by etching through the polystyrene, the BCP patterns were transferred into the underlying substrate in only one step. By using this polymer as a masking layer, Thomas et al. 14). Moreover, the magnetic properties and thermal stability of the dots could be tuned simply by changing the copolymer composition and etch depth into the cobalt [123, 140].

1). 17). Conveniently, the tert-butyl groups contain three low-energy methyl groups that drive the segregation of the photoactive compound to the surface, where it is most effectively exposed to UV light. The surface-segregating properties are not limited to the tert-butyl group, however; many other protecting groups could be used. Moreover, the functional, chemically distinct polymers used in photoresists will exist in a microphase-separated state if they are incorporated into a BCP. The microdomains form with diameters within one radius of gyration of the polymer chain, which usually is about 5–30 nm.

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Advanced Nanomaterials, Two Volume Edition by Kurt E. Geckeler, Hiroyuki Nishide


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