By Weilie Zhou
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Extra resources for Advanced scanning microscopy for nanotechnology techniques and applications
For the situation illustrated in left side of Fig. 5, many of the emitted electrons are blocked by the surface island of the specimen and this results in a dark contrast in the image. In contrast, a bright contrast will occur if the emitted electrons are not blocked by the island (right side of Fig. 5). A bias can be applied on the detector so that the secondary electrons from the shadow side can reach the detector. Surface topography can also influence the emission efficiency of secondary electrons.
An intelligent switch box is placed between the EDX and the SEM and this arbitrates between the EDX and EBSD systems’ access to the SEM. In addition to beam control, for large sample area coverage, integrated stage motion is required. SEM motorized stages are often accessible 2. 9. Example EBSP from Quartz. 10. Schematic of SEM interface. through an RS232 serial computer interface or Ethernet connection, which can be addressed by the operating software. As the technique has developed in automated accuracy and overall speed, the ability to scan the beam over multiple points on the sample to create an OM has become practical, and is now the most common method for a microstructural investigation with EBSD.
By contrast, at a longer WD, corresponding to a narrow cone of electron beam results in an enhanced depth of field. However, a long WD does not mean a high resolution. Depth of field is important when we observe a specimen with large topographical variation. In this case, we prefer to use a long WD so that we can bring as much of the image into focus as possible. 18. SEM image of SnO2 nanojunctions showing depth of field. 1. 19. Beam diagram showing enhancement of depth of field (DF) by increasing working distance (WD).
Advanced scanning microscopy for nanotechnology techniques and applications by Weilie Zhou